NALIN KUMAR
Partial List of Publications
  • M. S. Chung, N. M. Miskovsky, P. H. Cutler, Nalin Kumar, V. Patel, “Theoretical Analysis of a Field Emission Enhanced Semiconductor Thermoelectric Cooler”, accepted for publication in Solid State Electronics, 2003.
  • P. H. Cutler, N. M. Miskovsky, N. Kumar, and M. S. Chung, “New results on microelectronic cooling using the inverse Nottingham effect”, Cold Cathodes Proceedings, Vol. 2000-28 of the Electrochemical Society, 98-114 (2001).
  • M. S. Chung, N. M. Miskovsky, P. H. Cutler, and N. Kumar, “Band structure calculation of field emission from AlxGa1-xN as a function of stoichiometry”, Appl. Phys. Lett 76, 1143 (2000).
  • S. Jacobsen, S. Yang, F. Zhang, C. Summers, C. Bojkov, N. Kumar, L. Fredin and H. Schmidt, ‘Improved Performance of Low Voltage Phosphors for Field Emission Displays’, presented at the 1995 SID Display Manufacturing Research Conference, Santa Clara, January 1995.
  • C. Bojkov, N. Kumar, S. Jacobsen, S. Yang, and C. Summers, Proc. 1995 SID Asia Display, Hamamatsu, Japan, October 16-18, 1995, pp S26-1.
  • R.L. Fink, C. Xie, C.N. Potter, B. Lin, N. Kumar, H.K. Schmidt, L. Fredin, W. Brookover and R. Miller, 'Optimization of Amorphic diamond for diode field emission displays', Proc. of Society for Information Display Conference Technical Digest 1995.
  • N. Kumar et al., 'Development of nano-crystalline diamond based field emission displays', Proc. of Society for Information Display Conference Technical Digest, pp 43-46 (1994).
  • C. Xie and N. Kumar, 'Use of diamond thin films for low cost field emission displays', 7th International Vacuum Microelectronics Conference Technical Digest, pp 229-232 (1994).
  • N. Kumar, C. Xie, N. Potter, A. Krishnan, C. Hilbert, D. Eichman, E. Schlam, H. Schmidt and S. Wagal, 'Field Emission Displays Based on Diamond Thin Films', Proc. of Society for Information Display Conference Technical Digest, pp 1009-1010 (1993).
  • C. Xie and N. Kumar, Electron emission from amorphic diamond thin films', 6th International Vacuum Microelectronics Conference Technical Digest, pp 162-163 (1993).
  • N. Kumar, K. Pourrezaei and M. Ihsan, ' Summary Abstract: Aluminum deposition on optical fiber by a hollow cathode magnetron sputtering system', J. Vac. Sci. Technol. A 6 (3), 1772 (1988).
  • M. S. Chung, N. M. Miskovsky, P. H. Cutler, and N. Kumar, “The effect of stoichiometry and doping on the field emission characteristics of the ternary alloys, AlxGa1-xN”, J. Vac. Sci. Technol. B18, 919 (2000).
  • N. Kumar, J.T. McGinn, K. Pourrezaei, B. Lee and E.C. Douglas, 'Transmission electron microscopy studies of brown and golden titanium nitride thin films as diffusion barriers in very large scale integrated circuits,' J. Vac. Sci. Technol. A 6 (3), 1602 (1988).
  • B. Lee, E.C. Douglas, K. Pourrezaei and N. Kumar, ' Effect of oxygen on the diffusion barrier properties of TiN', Proc. 4th Int. IEEE VLSI Interconn. Conf., Santa Clara, CA, June 15-16, 1987, pp 344-350.
  • N. Kumar, B. Lee, K. Pourrezaei, M.G. Fissel and E.C. Douglas, "Application of TiN and TiOxNy thin film diffusion barriers in SOS integrated circuits", Proc. Of International Plasma Applications and Technology Conference, Brighton, UK, May 27-29, 1987.
  • N. Kumar, M.G. Fissel, K. Pourrezaei, B. Lee and E.C. Douglas, Thin Solid Films, 153, 287 (1987).
  • N. Kumar, K. Pourrezaei, M. Fissel, T. Begley, B. Lee and E.C. Douglas, J. Vac. Sci. Technol. A, 5 (4), Pt. III, 1778 (1987).
  • N. Kumar, K. Pourrezaei, R.J. DeMaria and B. Singh, 'Deposition of aluminum nitride films using RF reactive sputtering', Mat. Res. Soc. Symp. Proc. Vol. 68, 357 (1986).
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